Nikon NEXIV VMR-12072

1200 x 720mm stage travel is more than adequate to handle large flat panels, shadow masks, etching sheets for lead frames, LCDs, mask patterns, and other large work-pieces; 150mm Z-axis stroke; bright diascopic illumination

3 models (type: 1, 2, 3) with 5 step zoom magnification to cover different fields of view and resolution requirements

Laser AF also enables measurements of height variance and warping in workpieces

Search function facilitates measurements of lands and holes of PCBs

Variety of illumination choices facilitate accurate edge detection even for vague geometries

High-speed stage and high-speed image processing provide high throughput

Achieves ultra-high magnification measurements with a long 1200 x 720mm stage stroke. Ideal for measuring minute line widths of large-size display panels.

Automatic measurements of batches of small parts

Laser AF achieves high-accuracy measurements of bump heights

Laser AF enables measurements of height variance and warping in workpieces

Search function enables measurements of lands and holes of PCBs

Search function also provides accurate measurements even when workpieces are not located properly on the stage

Variety of illumination choices facilitate accurate edge detection even for weak edges

High-speed stage and image processing provide higher throughput

Ideal for LCD glass substrates (pattern measurements) and organic EL glass substrates (pattern measurements)

Full range of Nikon CFI60 LU microscope objectives from 5x to 150x

Supports brightfield, darkfield, DIC, simple polarizing applications

Motorized quintuple universal nosepiece

Easy to use software controls all functions of the system